Vesta Technology

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Technology

Atomic layer deposition (ALD) technology is the most advanced leading-edge technology based on nano-technology innovation.

Atomic Layer Deposition (ALD) is the next generation technology to replace CVD / PVD technology. Basic ALD technology concept is to deposit one atomic layer per cycle during deposition. ALD is a surface controlled layer-by-layer process for the deposition of thin films with atomic layer accuracy which is basic fundamentals of nano-technology. Each atomic layer formed in the sequential process is a result of self-limited chemical reactions which can be done at very low temperature and gives excellent step-coverage.